Wafers generated through the CZ method are often used for commercial purposes, but for specific applications (i.e., laboratory cells), a float zone wafer is a much-preferred option. Mainly because FZ wafers perform better, which is necessary for high-efficiency laboratory or niche market solar cells and because one can encounter several problems when using CZ wafer for such applications. In this article, we will discuss the common issues encountered in wafers generated through the CZ method.
Wafers generated through the CZ method contain high levels of oxygen. This affects the quality of the wafer because oxygen impurities decrease the minority carrier lifetime in different applications, especially in solar cells. This results in a reduction in voltage, current, and efficiency.
Because wafers generated through the CZ method contain high levels of oxygen, they're susceptible to high-temperature processing. This makes them very active when triggered by higher temperatures, making them volatile for high-power and high-frequency applications.To overcome these problems, you should use a Float zone wafer instead, especially if you're using it for laboratory cells or niche market solar cells. Float zone wafers contain low levels of oxygen impurities, have higher growth rates, precise dopant control, and contains minimal defects. The only drawback of using FZ wafers is that they're pricier.
Silicon wafers generated through the CZ method are suitable for commercial applications. Still, for high-power applications, like discrete power devices, high-efficiency solar panels, and radio-frequency chips, it's best to invest in using a float zone wafer. At Wafer World, we offer high-quality wafers at a reasonable price! Contact us for inquiries!
