Float zone (FZ) silicon wafers play a very important role in AI. Although unknown, most AI chips stem from a float zone wafer due to its high purity and other unique properties. Because of that, this method for wafer manufacturing contributes to driving the AI revolution.
In this article, we’ll explore what makes float zone silicon so special and why it’s essential for AI chip manufacturing, revealing the secrets behind the material.
Float zone silicon is an incredibly pure crystalline silicon substrate used for manufacturing semiconductors, including AI accelerator chips and microprocessors. Their name comes from the distinctive "float zone" method which helps grow semiconductor crystals with less impurities.
By employing a narrow-heated zone to melt and recrystallize a rotating rod of polycrystalline silicon, float zoning produces silicon wafers with higher purity levels than traditional silicon wafer production using the Czochralski (CZ) method.
This purity allows manufacturers to design chips for AI hardware that are faster, more efficient, and more scalable. Because of that, float zone silicon wafers are the perfect substrate for producing AI chips that can handle large models.
IA is becoming more important to the US economic matrix, but for its growth to continue, market demands of AI chips need to be made. This is quite a challenge for chip and wafer manufacturers, that need to find more effective ways to develop these highly specialized components at faster rates.
Any time soon, it’s difficult to see manufacturers like Wafer World meeting industry demands. However, innovations and new equipment may change the situation. If you’re interested in learning more about our production methods, reach out!
