The float zone method is an advanced technique that allows the manufacture of higher-purity silicon, offering superior electrical characteristics. The result is a versatile FZ wafer that can be used in various electronics and optoelectronics applications.
Specifically, FZ wafers can be used to manufacture unique types of transistors. Let’s go over some of them.
Float Zone wafers are particularly well-suited for applications in various types of transistors, including:
Because of their high material quality, which lowers defects and enhances electrical characteristics, FZ wafers can be used to produce high-performance BJTs.
Their excellent electrical characteristics make FZ wafer-based MOSFETs perfect for high-frequency and high-voltage applications.
FZ wafers' high-speed switching capabilities and low on-state voltage drop benefit IGBTs, particularly in power electronics.
While not directly made from FZ silicon, the techniques and principles used in FZ wafers can also apply to SiC and GaN materials used for high-power and high-temperature applications.
These are frequently employed in radio frequency applications and profit from the superior properties that FZ wafers can offer.
High-quality FZ wafers can also be used to fabricate transistors for optoelectronic devices like lasers or photodetectors.
FZ wafers are commonly used in semiconductors due to their high purity and crystallinity. These unique properties make them irreplaceable materials in electronics that use the different types of transistors we mentioned.
However, finding a reliable provider is key to ensuring the functionality of these devices. Here at Wafer World, we have extensive quality tests to ensure the quality of our semiconductors. If you’d like to learn more about them, reach out!